Inventor
Tadashi Takasaki
Inventor
Toyama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C23CCoating metallic material26%
H01LSemiconductor devices24%
H01JElectric discharge tubes or discharge lamps12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G05BControl or regulating systems in general2%
G06NComputing arrangements based on specific computational models2%
PatentTitleYear
11,104,995Substrate processing apparatus202110,651,068Method of manufacturing semiconductor device by setting process chamber to maintenance enable state202010,503,152Method of manufacturing semiconductor device201910,453,720Method of manufacturing semiconductor device201910,424,520Method of manufacturing semiconductor device20199,728,431'Method of manufacturing semiconductor device'20179,659,767'Substrate processing apparatus and method of manufacturing semiconductor device'20179,508,546'Method of manufacturing semiconductor device'20169,163,309'Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium'20159,070,554'Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium'20158,986,450'Substrate processing apparatus and method of manufacturing semiconductor device'20158,925,562'Substrate processing apparatus and method of manufacturing semiconductor device'20158,222,161'Substrate processing apparatus and semiconductor devices manufacturing method'20127,943,528'Substrate processing apparatus and semiconductor devices manufacturing method'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2021Patents assigned to HITACHI INT ELECTRIC INC (10)· patent assignee history
2011Based in Kodaira, JP· patent location history
2012Patents assigned to SAKUMA HARUNOBU (1)· patent assignee history
2012Patents assigned to TAKASAKI TADASHI (1)· patent assignee history
2012Patents assigned to TANABE MITSURO (1)· patent assignee history
2012Based in Tokyo, JP· patent location history
2015–2021Based in Toyama, JP· patent location history
2019–2021Patents assigned to KOKUSAI ELECTRIC CORP (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 10 | 2011–2021 |
| KOKUSAI ELECTRIC CORP | 5 | 2019–2021 |
| SAKUMA HARUNOBU | 1 | 2012 |
| TAKASAKI TADASHIself | 1 | 2012 |
| TANABE MITSURO | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 12 | 2015–2021 |
| Tokyo, JP | 1 | 2012 |
| Kodaira, JP | 1 | 2011 |