Inventor
Yuko Yako
Inventor
Takatsuki, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests40%
C03CChemical composition of glasses, glazes or vitreous enamels7%
PatentTitleYear
7,338,737'Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel'20086,280,902'Positive working photoresist compositions comprising a nitrogen-containing cyclic compound'20016,165,677'Photoresist composition'20006,040,112'Photoresist composition'20005,985,511'Photoresist composition'19995,916,728'Positive resist composition'19995,891,601'Positive resist composition'19995,846,688'Photoresist composition'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2008Patents assigned to SUMITOMO CHEMICAL CO (8)· patent assignee history
1998–2001Based in Takatsuki, JP· patent location history
1999–2008Based in Osaka, JP· patent location history
2008Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 8 | 1998–2008 |
| SAMSUNG ELECTRONICS CO LTD | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takatsuki, JP | 5 | 1998–2001 |
| Osaka, JP | 3 | 1999–2008 |