Inventor
Kenro Hayashi
Inventor
Hadano, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C04Bprimary
C04BLime, magnesia43%
C30BSingle-crystal growth43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
5,788,763'Manufacturing method of a silicon wafer having a controlled BMD concentration'19984,836,965'Method of producing heat treating furnace member'19894,753,763'Method of manufacturing heating furnace parts'19884,619,798'Method of manufacturing parts for use to the heat processing furnace'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1998Patents assigned to TOSHIBA CERAMICS CO (4)· patent assignee history
1986–1989Based in Hadano, JP· patent location history
1998Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA CERAMICS CO | 4 | 1986–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hadano, JP | 3 | 1986–1989 |
| Kanagawa, JP | 1 | 1998 |