Inventor
Hakaru Kyuragi
Inventor
Tokyo, JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Vprimary
G06VImage or video recognition or understanding26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y10TTechnical subjects covered by former us classification9%
B05DProcesses for applying fluent materials to surfaces, in general7%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form7%
A61BDiagnosis4%
B29CShaping or joining of plastics4%
G01RMeasuring electric variables4%
H05KPrinted circuits4%
PatentTitleYear
7,907,895'Electric field sensor device, transceiver, positional information obtaining system and information input system'20117,360,293'Method of manufacturing recognition sensor'20087,187,785'Image processing method and apparatus'20077,123,026'Surface shape recognition sensor and method of manufacturing the same'20067,062,075'Surface shape recognition sensor device'20067,045,379'Method of manufacturing surface shape recognition sensor'20067,017,637'Thin film forming apparatus and thin film forming method'20066,990,219'Image capturing method and apparatus and fingerprint collation method and apparatus'20066,917,694'Surface shape recognition apparatus and method'20056,844,744'Surface shape recognition sensor and method of manufacturing the same'20056,727,561'Surface shape recognition sensor and method of manufacturing the same'20046,714,666'Surface shape recognition apparatus'20046,624,644'Electro-optic probe and magneto-optic probe'20036,556,935'Small shape recognizing capacitive sensor device'20036,518,083'Surface shape recognition sensor and method of manufacturing the same'20036,468,895'Pattern forming method'20026,429,669'Temperature-insensitive electro-optic probe'20026,340,641'Substrate flattening method and film-coated substrate made thereby'20026,232,216'Thin film forming method'20016,092,578'Transferring thin film to a substrate'20006,086,699'Thin film-forming method and thin film-forming apparatus therefor'20005,972,780'Thin film forming apparatus and method'19994,557,036'Semiconductor device and process for manufacturing the same'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2011Patents assigned to NIPPON TELEGRAPH & TELEPHONE (22)· patent assignee history
1985Based in Tokorozawa, JP· patent location history
1999–2011Based in Tokyo, JP· patent location history
2000–2002Patents assigned to CATALYSTS & CHEM IND CO (2)· patent assignee history
2000–2002Based in Machida, JP· patent location history
2002–2003Patents assigned to ANDO ELECTRIC (2)· patent assignee history
2006Patents assigned to NTT ELECTRONICS CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON TELEGRAPH & TELEPHONE | 22 | 1985–2011 |
| ANDO ELECTRIC | 2 | 2002–2003 |
| CATALYSTS & CHEM IND CO | 2 | 2000–2002 |
| NTT ELECTRONICS CORP | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 19 | 1999–2011 |
| Machida, JP | 3 | 2000–2002 |
| Tokorozawa, JP | 1 | 1985 |