Inventor

Qi Fan

Inventor

Ann Arbor, MI, US

Overview

2001–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material13%

H01JElectric discharge tubes or discharge lamps13%

LOC1413%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%

B23FMaking gears or toothed racks7%

C01BNon-metallic elements7%

F16HGearing7%

G03DApparatus for processing exposed photographic materials7%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%

H01GCapacitors7%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2001Based in Tokyo, JP· patent location history

2004Patents assigned to FAN QI HUA (1)· patent assignee history

2004–2017Based in Ann Arbor, MI, US· patent location history

2015Patents assigned to FAN QI (1)· patent assignee history

2015Patents assigned to GLEASON WORKS (1)· patent assignee history

2015Based in Rochester, NY, US· patent location history

2016Patents assigned to TENCENT TECH SHENZHEN CO LTD (2)· patent assignee history

2016Based in Guangdong, CN· patent location history

2021Patents assigned to FRAUNHOFER USA (1)· patent assignee history

2021Based in Okemos, MI, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations