Inventor

Dirk Funhoff

Inventor

Heidelberg, DE

Overview

15→

Patents

1991–2008

Patent span

Chemistry

Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%

C07DHeterocyclic compounds8%

C09KMaterials for miscellaneous applications, not provided for elsewhere8%

C07CAcyclic or carbocyclic compounds6%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%

G03GElectrography6%

Y10TTechnical subjects covered by former us classification6%

B05DProcesses for applying fluent materials to surfaces, in general3%

B82YSpecific uses or applications of nanostructures3%

PatentTitleYear

7,345,173'Work-up of the mother liquor obtained in the preparation of high-purity triethylenediamine'2008 6,552,194'Process for the preparation of pure triethylenediamine (TEDA)'2003 5,914,219'Radiation-sensitive mixture and the production of relief structures having improved contrast'1999 5,846,689'Positive-working radiation-sensitive mixture and production of relief structures'1998 5,783,354'Positive-working radiation-sensitive mixture'1998 5,759,750'Radiation-sensitive mixture'1998 5,736,068'Triphenylene compounds and preparation of discotic liquid crystalline crosslinked polymers'1998 5,563,022'Positive-working radiation-sensitive mixture and the production of relief patterns'1996 5,518,824'Electroluminescent arrangement'1996 5,429,770'Low-molecular-weight and polymeric liquid-crystalline benzotriazoles, and the use thereof'1995 5,393,626'Increasing photoconductivity by adjusting the discotic phase'1995 5,318,876'Radiation-sensitive mixture containing acid-labile groups and production of relief patterns'1994 5,204,178'(Meth)acrylate copolymers and their use in nonlinear optics and for the production of Langmuir-Blodgett'1993 5,103,060'Compounds which are ethylenically unsaturated in the terminal position, and the use thereof in nonlinear optics'1992 5,049,462'Reading out information stored in thin polymer layers'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2003Patents assigned to BASF AG (14)· patent assignee history

1991–1999Based in Heidelberg, DE· patent location history

1998Based in Weinheim, DE· patent location history

2003–2008Based in Mannheim, DE· patent location history

2008Patents assigned to BASF SE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
BASF AG	14	1991–2003
BASF SE	1	2008

Locations

Location	Patents	Span
Heidelberg, DE	11	1991–1999
Mannheim, DE	2	2003–2008
Weinheim, DE	2	1998