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Inventor

Miwa Shimizu

Inventor
Nagano, JP

Overview

3→
Patents
2007–2012
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters25%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables13%
G03GElectrography13%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
PatentTitleYear
8,246,900'Annealing apparatus'20127,484,724'Recording-medium returning mechanism and a recording apparatus including the same, and medium-returning mechanism and a liquid ejection apparatus including the same'20097,303,190'Recording apparatus including automatic feeding mechanism and automatic feeding mechanism'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2009Patents assigned to SEIKO EPSON CORP (2)· patent assignee history
2007–2009Based in Nagano, JP· patent location history
2012Patents assigned to KASAI SHIGERU (1)· patent assignee history
2012Patents assigned to MIYASHITA HIROYUKI (1)· patent assignee history
2012Patents assigned to NOMURA MASAMICHI (1)· patent assignee history
2012Patents assigned to SHIMIZU MIWA (1)· patent assignee history
2012Based in Nirasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEIKO EPSON CORP22007–2009
KASAI SHIGERU12012
MIYASHITA HIROYUKI12012
NOMURA MASAMICHI12012
SHIMIZU MIWAself12012
Locations
LocationPatentsSpan
Nagano, JP22007–2009
Nirasaki, JP12012