Inventor
CHIH-MIN HSIAO
Inventor
TW
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H10DInorganic electric semiconductor devices7%
G06FElectric digital data processing5%
H10BElectronic memory devices3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B82YSpecific uses or applications of nanostructures2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
PatentTitleYear
12,566,577Data access method and storage subsystem therefor202612,494,359Stacked wafer structure and method for forming the same202512,494,411Integrated circuit and method of forming the same202512,265,739Data access interface unit and the method for processing I/O requests202512,266,528Method for forming patterned mask layer202512,255,238Integrated circuit, system and method of forming same202512,243,744Method for forming semiconductor structure202512,191,155Semiconductor structures and method for manufacturing the same202512,125,712Landing metal etch process for improved overlay control202412,080,544Stacked wafer structure and method for forming the same202412,062,543Line-end extension method and device202412,014,926Self aligned litho etch process patterning method202411,901,286Diagonal via pattern and method202411,854,807Line-end extension method and device202311,798,812Landing metal etch process for improved overlay control202311,715,638Method for forming semiconductor structure202311,699,589Method for forming patterned mask layer202311,610,778Self aligned litho etch process patterning method202311,322,362Landing metal etch process for improved overlay control202211,201,064Signal line patterning for standard cells2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (18)· patent assignee history
2021–2026Based in TW· patent location history
2025–2026Patents assigned to INFORTREND TECH INC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 18 | 2021–2025 |
| INFORTREND TECH INC | 2 | 2025–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 20 | 2021–2026 |