Inventor
SHU KUAN
Inventor
TW
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices33%
H10DInorganic electric semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B82YSpecific uses or applications of nanostructures11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
12,389,638Method of forming fully strained channels202512,148,794Method of manufacturing a semiconductor device and a semiconductor device202412,119,394Method of manufacturing a semiconductor device and a semiconductor device202412,021,143P-type strained channel in a fin field effect transistor (FinFET) device202411,817,499P-type strained channel in a fin field effect transistor (FinFET) device202311,670,681Method of forming fully strained channels202311,404,574P-type strained channel in a fin field effect transistor (FinFET) device202211,393,898Method of manufacturing a semiconductor device and a semiconductor device202211,367,784Method of manufacturing a semiconductor device and a semiconductor device2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (9)· patent assignee history
2022–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 9 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 9 | 2022–2025 |