Inventor
Hun Sang Kim
Inventor
San Ramon, CA, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1037%
H01LSemiconductor devices26%
H01JElectric discharge tubes or discharge lamps16%
C23CCoating metallic material11%
H10BElectronic memory devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
10,770,329Gas flow for condensation reduction with a substrate processing chuck202010,186,444Gas flow for condensation reduction with a substrate processing chuck20199,627,216'Method for forming features in a silicon containing layer'20179,425,058'Simplified litho-etch-litho-etch process'20169,287,124'Method of etching a boron doped carbon hardmask'20168,293,656'Selective self-aligned double patterning of regions in an integrated circuit device'20128,133,819'Plasma etching carbonaceous layers with sulfur-based etchants'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2020Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
2012Patents assigned to KIM HUN SANG (2)· patent assignee history
2012Patents assigned to HSIEH CHANG-LIN (1)· patent assignee history
2012Patents assigned to KOSEKI SHINICHI (1)· patent assignee history
2012Patents assigned to LIAO BRYAN (1)· patent assignee history
2012–2020Based in San Ramon, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 2012–2020 |
| KIM HUN SANGself | 2 | 2012 |
| HSIEH CHANG-LIN | 1 | 2012 |
| KOSEKI SHINICHI | 1 | 2012 |
| LIAO BRYAN | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Ramon, California, US | 7 | 2012–2020 |