Inventor
Si-Han Zeng
Inventor
New Taipei, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01BMeasuring length, thickness or similar linear dimensions22%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
H01JElectric discharge tubes or discharge lamps11%
H01LSemiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
11,120,970Ion implantation system202110,474,043Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method201910,261,427Metrology method and apparatus, computer program and lithographic system20199,869,940'Metrology method and apparatus, computer program and lithographic system'2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2019Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2018–2019Based in New Taipei, TW· patent location history
2021Patents assigned to SHANGHAI IC R&D CT CO LTD (1)· patent assignee history
2021Based in Shanghai, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 3 | 2018–2019 |
| SHANGHAI IC R&D CT CO LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| New Taipei, TW | 3 | 2018–2019 |
| Shanghai, CN | 1 | 2021 |