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Inventor

Hiroyuki Kamijou

Inventor
Kanagawa, JP

Overview

3→
Patents
1998–2005
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1060%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1040%
PatentTitleYear
6,919,260'Method of manufacturing a substrate having shallow trench isolation'20055,994,756'Substrate having shallow trench isolation'19995,854,133'Method for manufacturing a semiconductor device'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2005Patents assigned to TOSHIBA KK (3)· patent assignee history
1998Based in Yokkaichi, JP· patent location history
1999–2005Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK31998–2005
Locations
LocationPatentsSpan
Kanagawa, JP21999–2005
Yokkaichi, JP11998