Inventor
Yueh-Lin Chou
Inventor
Taichung, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,498,105'Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask'20096,492,069'Method for forming an attenuated phase-shifting mask'20026,015,641'Reduction of optical proximity effect of bit line pattern in DRAM devices'20005,478,679'Half-tone self-aligning phase shifting mask'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2009Patents assigned to UNITED MICROELECTRONICS CORP (2)· patent assignee history
1995Based in Hsinchu, TW· patent location history
2000Patents assigned to WORLDWIDE SEMICONDUCTOR MANUFA (1)· patent assignee history
2000–2009Based in Taichung, TW· patent location history
2002Patents assigned to WORLDWIDE SEMICONDUCTOR MFG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 2 | 1995–2009 |
| WORLDWIDE SEMICONDUCTOR MANUFA | 1 | 2000 |
| WORLDWIDE SEMICONDUCTOR MFG | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taichung, TW | 3 | 2000–2009 |
| Hsinchu, TW | 1 | 1995 |