Inventor
Khiem K. Nguyen
Inventor
San Jose, CA, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
H01LSemiconductor devices10%
C23CCoating metallic material7%
A63HToys, e.g. tops, dolls, hoops or building blocks2%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
B43KImplements for writing or drawing2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
PatentTitleYear
11,066,521Silicone elastomer composition202110,535,549Lift pin holder202010,170,280Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall20199,978,632Direct lift process apparatus20189,218,944'Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors'20158,017,029'Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside'20118,012,366'Process for etching a transparent workpiece including backside endpoint detection steps'20118,002,946'Mask etch plasma reactor with cathode providing a uniform distribution of etch rate'20117,976,671'Mask etch plasma reactor with variable process gas distribution'20117,967,930'Plasma reactor for processing a workpiece and having a tunable cathode'20117,879,151'Mask etch processing apparatus'20117,846,848'Cluster tool with integrated metrology chamber for transparent substrates'20107,682,984'Interferometer endpoint monitoring device'20107,601,272'Method and apparatus for integrating metrology with etch processing'20097,128,806'Mask etch processing apparatus'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
2006–2020Based in San Jose, CA, US· patent location history
2015Patents assigned to CHANDRACHOOD MADHAVI R (1)· patent assignee history
2015Patents assigned to GRIMBERGEN MICHAEL N (1)· patent assignee history
2015Patents assigned to IBRAHIM IBRAHIM M (1)· patent assignee history
2015Patents assigned to KUMAR AJAY (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 14 | 2006–2020 |
| CHANDRACHOOD MADHAVI R | 1 | 2015 |
| GRIMBERGEN MICHAEL N | 1 | 2015 |
| IBRAHIM IBRAHIM M | 1 | 2015 |
| KUMAR AJAY | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 14 | 2006–2020 |