Inventor
Haruki Inabe
Inventor
Shizuoka, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
C07CAcyclic or carbocyclic compounds8%
H01LSemiconductor devices5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments2%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%
G08GTraffic control systems2%
PatentTitleYear
9,835,945Positive resist composition and method of pattern formation with the same20179,798,235'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20179,703,196'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20179,541,831'Positive resist composition and method of pattern formation with the same'20179,465,292'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20169,316,912'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20169,057,952'Positive resist composition and method of pattern formation with the same'20159,023,576'Positive resist composition for immersion exposure and pattern-forming method using the same'20158,871,421'Positive resist composition and method of pattern formation with the same'20148,828,643'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20148,815,478'Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound'20148,808,975'Positive resist composition for immersion exposure and pattern-forming method using the same'20148,778,235'Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter'20148,426,109'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20138,389,200'Pattern forming method'20138,039,197'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20117,906,268'Positive resist composition for immersion exposure and pattern-forming method using the same'20117,892,722'Pattern forming method'20117,842,452'Pattern forming method'20107,820,748'Insulating film forming composition and electronic device'20107,803,511'Positive resist composition for immersion exposure and pattern-forming method using the same'20107,772,344'Insulating film-forming composition'20107,700,260'Pattern forming method'20107,645,557'Positive resist composition for immersion exposure and pattern forming method using the same'20107,611,820'Positive resist composition and pattern-forming method using the same'20097,531,287'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20097,482,112'Pattern forming method'20097,157,206'Positive resist composition'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2017Based in Shizuoka, JP· patent location history
2009–2017Patents assigned to FUJIFILM CORP (27)· patent assignee history
2010–2017Based in Haibara-gun, JP· patent location history
2013–2015Patents assigned to INABE HARUKI (8)· patent assignee history
2013–2015Patents assigned to KANDA HIROMI (6)· patent assignee history
2013–2015Patents assigned to KANNA SHINICHI (5)· patent assignee history
2014Patents assigned to GOTO AKIYOSHI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 27 | 2009–2017 |
| INABE HARUKIself | 8 | 2013–2015 |
| KANDA HIROMI | 6 | 2013–2015 |
| KANNA SHINICHI | 5 | 2013–2015 |
| GOTO AKIYOSHI | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 24 | 2007–2017 |
| Haibara-gun, JP | 4 | 2010–2017 |