Inventor
TAE SEUNG CHO
Inventor
US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps50%
H01LSemiconductor devices14%
H05HPlasma technique14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H03HImpedance networks, e.g. resonant circuits7%
PatentTitleYear
12,009,228Low temperature chuck for plasma processing systems202412,002,659Apparatus for generating etchants for remote plasma processes202411,915,911Two piece electrode assembly with gap for plasma control202411,901,161Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes202411,594,428Low temperature chuck for plasma processing systems202311,373,845Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes202211,361,941Methods and apparatus for processing a substrate2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to APPLIED MATERIALS INC (7)· patent assignee history
2022–2024Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 7 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 7 | 2022–2024 |