Inventor
Shingo Tahara
Inventor
Ibaraki, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices16%
C08LCompositions of macromolecular compounds11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
H01JElectric discharge tubes or discharge lamps5%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
11,120,999Plasma etching method202110,175,577Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component20199,633,848'Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device'20179,395,626'Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component'20168,836,089'Positive photosensitive resin composition, method of creating resist pattern, and electronic component'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2019Patents assigned to HITACHI CHEMICAL CO LTD (4)· patent assignee history
2014Patents assigned to AOKI YU (1)· patent assignee history
2014Patents assigned to KASUYA KEI (1)· patent assignee history
2014Patents assigned to MATSUTANI HIROSHI (1)· patent assignee history
2014Patents assigned to NOBE SHIGERU (1)· patent assignee history
2014–2017Based in Hitachi, JP· patent location history
2016–2019Based in Ibaraki, JP· patent location history
2021Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 4 | 2014–2019 |
| AOKI YU | 1 | 2014 |
| KASUYA KEI | 1 | 2014 |
| MATSUTANI HIROSHI | 1 | 2014 |
| NOBE SHIGERU | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ibaraki, JP | 2 | 2016–2019 |
| Hitachi, JP | 2 | 2014–2017 |
| Miyagi, JP | 1 | 2021 |