Inventor
YONG-JHIN CHO
Inventor
KR
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
B08BCleaning in general15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
C23CCoating metallic material5%
F26BDrying solid materials or objects by removing liquid therefrom5%
PatentTitleYear
12,110,593Apparatus for fabricating semiconductor device having upper and lower inlets for supplying supercritical fluids and method of fabricating semiconductor device using the same202411,887,868Substrate processing apparatus and apparatus for manufacturing integrated circuit device202411,742,222Apparatus for removing a photoresist and apparatus for manufacturing a comiconductor device202311,610,788Process chamber and substrate processing apparatus including the same202311,545,373Apparatus for removing a photoresist and apparatus for manufacturing a semiconductor device202311,189,503Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to SAMSUNG ELECTRONICS CO LTD (6)· patent assignee history
2021–2024Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 6 | 2021–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 6 | 2021–2024 |