Inventor

Sander Bas Roobol

Inventor
Veldhoven, NL

Overview

19→
Patents
2018–2021
Patent span
Physics
Primary field (CPC G)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
G01NInvestigating or analysing materials by determining their chemical or physical properties23%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
H05GX-ray technique10%
G01BMeasuring length, thickness or similar linear dimensions8%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light8%
G02BOptical elements, systems or apparatus3%
G21KHandling of particles or ionising radiation not otherwise provided for2%
H01LSemiconductor devices2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
11,092,902Method and apparatus for detecting substrate surface variations202110,983,361Methods of aligning a diffractive optical system and diffracting beams, diffractive optical element and apparatus202110,976,265Optical detector202110,816,906HHG source, inspection apparatus and method for performing a measurement202010,725,387Determining an edge roughness parameter of a periodic structure202010,670,974Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate202010,649,344Illumination source for an inspection apparatus, inspection apparatus and inspection method202010,630,037Apparatus for delivering gas and illumination source for generating high harmonic radiation202010,578,979Method and apparatus for inspection and metrology202010,530,111Apparatus for delivering gas and illumination source for generating high harmonic radiation202010,451,559Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,379,448Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus201910,330,606Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,267,744Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,248,029Method and apparatus for inspection and metrology201910,234,771HHG source, inspection apparatus and method for performing a measurement201910,133,192Method and apparatus for determining the property of a structure, device manufacturing method201810,067,068Lithographic apparatus and method for performing a measurement201810,048,596Method and apparatus for generating illuminating radiation2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018–2021Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history
2018–2021Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV192018–2021
Locations
LocationPatentsSpan
Veldhoven, NL192018–2021