Inventor

Daniel Kandel

Inventor

Aseret, IL

Overview

57→

Patents

2007–2021

Patent span

Physics

Primary field (CPC G)

Patents· 57 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%

G01NInvestigating or analysing materials by determining their chemical or physical properties16%

G01BMeasuring length, thickness or similar linear dimensions15%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

G02BOptical elements, systems or apparatus6%

H01LSemiconductor devices6%

G06FElectric digital data processing3%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%

G03HHolographic processes or apparatus2%

PatentTitleYear

11,093,840Metrology and process control for semiconductor manufacturing2021 11,054,752Device metrology targets and methods2021 10,916,404TEM-based metrology method and system2021 10,831,108Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology2020 10,685,165Metrology using overlay and yield critical patterns2020 10,591,406Symmetric target design in scatterometry overlay metrology2020 10,571,811Device metrology targets and methods2020 10,533,940Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology2020 10,527,954Multi-layer overlay metrology target and complimentary overlay metrology measurement systems2020 10,274,425Structured illumination for contrast enhancement in overlay metrology2019 10,261,014Near field metrology2019 10,234,280Reflection symmetric scatterometry overlay targets and methods2019 10,228,320Achieving a small pattern placement error in metrology targets2019 10,203,247Systems for providing illumination in optical metrology2019 10,139,528Compound objectives for imaging and scatterometry overlay2018 10,126,238Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology2018 10,101,592Self-moire target design principles for measuring unresolved device-like pitches2018 9,958,385Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology2018 9,934,353Focus measurements using scatterometry metrology2018 9,927,718'Multi-layer overlay metrology target and complimentary overlay metrology measurement systems'2018 9,903,711'Feed forward of metrology data in a metrology system'2018 9,875,946On-device metrology2018 9,869,543'Reducing algorithmic inaccuracy in scatterometry overlay metrology'2018 9,864,209'Self-moire target design principles for measuring unresolved device-like pitches'2018 9,851,300Decreasing inaccuracy due to non-periodic effects on scatterometric signals2017 9,841,689'Approach for model calibration used for focus and dose measurement'2017 9,784,987'Apodization for pupil imaging scatterometry'2017 9,739,702'Symmetric target design in scatterometry overlay metrology'2017 9,678,421'Target element types for process parameter metrology'2017 9,645,079'Structured illumination for contrast enhancement in overlay metrology'2017 9,620,426'Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation'2017 9,581,430'Phase characterization of targets'2017 9,512,985'Systems for providing illumination in optical metrology'2016 9,454,072'Method and system for providing a target design displaying high sensitivity to scanner focus change'2016 9,255,895'Angle-resolved antisymmetric scatterometry'2016 9,164,397'Optics symmetrization for metrology'2015 9,104,120'Structured illumination for contrast enhancement in overlay metrology'2015 9,093,458'Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets'2015 9,091,650'Apodization for pupil imaging scatterometry'2015 9,080,971'Metrology systems and methods'2015 8,913,237'Device-like scatterometry overlay targets'2014 8,908,175'Flexible scatterometry metrology system and method'2014 8,896,832'Discrete polarization scatterometry'2014 8,873,054'Metrology systems and methods'2014 8,848,186'Angle-resolved antisymmetric scatterometry'2014 8,655,469'Advanced process control optimization'2014 8,582,114'Overlay metrology by pupil phase analysis'2013 8,441,639'Metrology systems and methods'2013 8,214,771'Scatterometry metrology target design optimization'2012 8,142,966'Substrate matrix to decouple tool and process effects'2012 8,004,679'Target design and methods for scatterometry overlay determination'2011 7,616,313'Apparatus and methods for detecting overlay errors using scatterometry'2009 7,602,491'Optical gain approach for enhancement of overlay and alignment systems performance'2009 7,528,941'Order selected overlay metrology'2009 7,526,749'Methods and apparatus for designing and using micro-targets in overlay metrology'2009 7,440,105'Continuously varying offset mark and methods of determining overlay'2008 7,277,172'Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2021Based in Aseret, IL· patent location history

2009–2021Patents assigned to KLA TENCOR CORP (47)· patent assignee history

2012–2018Patents assigned to KANDEL DANIEL (13)· patent assignee history

2012–2015Patents assigned to MANASSEN AMNON (5)· patent assignee history

2013–2018Patents assigned to LEVINSKI VLADIMIR (5)· patent assignee history

2013–2015Patents assigned to SELIGSON JOEL (5)· patent assignee history

2021Based in Rehovot, IL· patent location history

2021Based in Ramat Gan, IL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KLA TENCOR CORP	47	2009–2021
KANDEL DANIELself	13	2012–2018
LEVINSKI VLADIMIR	5	2013–2018
MANASSEN AMNON	5	2012–2015
SELIGSON JOEL	5	2013–2015

Locations

Location	Patents	Span
Aseret, IL	55	2007–2021
Rehovot, IL	1	2021
Ramat Gan, IL	1	2021