Inventor
William D. Budinger
Inventor
Wilmington, DE, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing17%
B24DTools for grinding, buffing or sharpening15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B29CShaping or joining of plastics7%
B29LIndexing scheme associated with subclass b29c, relating to particular articles7%
G11BInformation storage based on relative movement between record carrier and transducer6%
C08JWorking-up6%
C09KMaterials for miscellaneous applications, not provided for elsewhere6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
6,903,021'Method of polishing a semiconductor device'20056,899,611'Polishing pad for a semiconductor device having a dissolvable substance'20056,860,793'Window portion with an adjusted rate of wear'20056,518,188'Apparatus and methods for chemical-mechanical polishing of semiconductor wafers'20036,517,417'Polishing pad with a transparent portion'20036,488,570'Method relating to a polishing system having a multi-phase polishing layer'20026,439,989'Polymeric polishing pad having continuously regenerated work surface'20026,375,559'Polishing system having a multi-phase polishing substrate and methods relating thereto'20026,375,694'Polishing slurry compositions capable of providing multi-modal particle packing'20026,337,281'Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like'20026,245,679'Apparatus and methods for chemical-mechanical polishing of semiconductor wafers'20016,210,525'Apparatus and methods for chemical-mechanical polishing of semiconductor wafers'20016,210,254'Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)'20016,099,394'Polishing system having a multi-phase polishing substrate and methods relating thereto'20006,093,649'Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto'20006,069,080'Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like'20006,036,579'Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto'20006,030,899'Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers'20006,022,264'Polishing pad and methods relating thereto'20005,932,486'Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers'19995,900,164'Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements'19995,578,362'Polymeric polishing pad containing hollow polymeric microelements'19965,384,337'Poromeric material having uniformly distributed electrets for maintaining an electrostatic charge'19955,016,483'Method and apparatus for determination and display of critical gas supply information'19914,970,897'Method and apparatus for determination and display of gas consumption time'19904,927,432'Pad material for grinding, lapping and polishing'19904,926,703'Method and apparatus for determination and display of critical gas supply information'19904,876,903'Method and apparatus for determination and display of critical gas supply information'19894,512,113'Workpiece holder for polishing operation'19854,198,739'Printing roller with polymeric coner and method of making the same'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–2003Patents assigned to RODEL INC (21)· patent assignee history
1980Based in Chadds Ford, PA, US· patent location history
1985–1991Patents assigned to BUDINGER WILLIAM D (5)· patent assignee history
1985–1995Based in Kennett Square, PA, US· patent location history
1996–2005Based in Newark, DE, US· patent location history
1999–2002Based in Wilmington, DE, US· patent location history
2002–2005Based in Key West, FL, US· patent location history
2005Patents assigned to ROHM & HAAS ELECT MAT (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| RODEL INC | 21 | 1980–2003 |
| BUDINGER WILLIAM Dself | 5 | 1985–1991 |
| ROHM & HAAS ELECT MAT | 3 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wilmington, Delaware, US | 12 | 1999–2002 |
| Kennett Square, Pennsylvania, US | 7 | 1985–1995 |
| Newark, Delaware, US | 5 | 1996–2005 |
| Key West, Florida, US | 5 | 2002–2005 |
| Chadds Ford, Pennsylvania, US | 1 | 1980 |