Inventor
Owendi Ongayi
Inventor
Marlborough, MA, US
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C08LCompositions of macromolecular compounds5%
H01LSemiconductor devices5%
Y10TTechnical subjects covered by former us classification4%
C07CAcyclic or carbocyclic compounds3%
C07DHeterocyclic compounds3%
PatentTitleYear
10,754,249Coating compositions for photolithography202010,481,494Coating compositions for use with an overcoated photoresist201910,365,562Coating compositions for use with an overcoated photoresist201910,114,288Silicon-containing underlayers201810,031,420Wet-strippable silicon-containing antireflectant201810,007,184Silicon-containing underlayers20189,690,199'Coating compositions for photolithography'20179,581,901'Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device'20179,459,533'Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist'20169,442,377'Wet-strippable silicon-containing antireflectant'20169,323,154'Coating compositions for photolithography'20169,244,352'Coating compositions for use with an overcoated photoresist'20169,229,319'Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device'20169,206,276'Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device'20159,182,662'Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom'20159,182,669'Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device'20158,968,981'Coating compositions for use with an overcoated photoresist'20158,932,797'Photoacid generators'20158,900,792'Polymerizable photoacid generators'20148,703,383'Photosensitive copolymer and photoresist composition'20148,501,383'Coating compositions for use with an overcoated photoresist'20138,455,178'Coating compositions for photolithography'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2020Patents assigned to ROHM & HAAS ELECT MAT (21)· patent assignee history
2013–2019Patents assigned to ONGAYI OWENDI (10)· patent assignee history
2013–2019Patents assigned to JAIN VIPUL (7)· patent assignee history
2013–2019Patents assigned to ZAMPINI ANTHONY (6)· patent assignee history
2013–2019Patents assigned to COLEY SUZANNE (4)· patent assignee history
2013–2020Based in Marlborough, MA, US· patent location history
2016–2018Based in Tarragona, ES· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ROHM & HAAS ELECT MAT | 21 | 2013–2020 |
| ONGAYI OWENDIself | 10 | 2013–2019 |
| JAIN VIPUL | 7 | 2013–2019 |
| ZAMPINI ANTHONY | 6 | 2013–2019 |
| COLEY SUZANNE | 4 | 2013–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Marlborough, Massachusetts, US | 18 | 2013–2020 |
| Tarragona, ES | 4 | 2016–2018 |