Inventor

Rika Nogita

Inventor
Ube, JP

Overview

6→
Patents
2012–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
Y10TTechnical subjects covered by former us classification14%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
H01LSemiconductor devices9%
H05KPrinted circuits9%
H10HInorganic light-emitting semiconductor devices having potential barriers9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals5%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2013Patents assigned to HITACHI CHEM DUPONT MICROSYS (3)· patent assignee history
2012–2013Patents assigned to MINEGISHI TOMONORI (3)· patent assignee history
2012–2013Patents assigned to NOGITA RIKA (3)· patent assignee history
2012–2013Patents assigned to KAWASAKI DAI (2)· patent assignee history
2012–2013Based in Ibaraki, JP· patent location history
2012Based in Hitachi, JP· patent location history
2015–2017Patents assigned to UBE MAT IND LTD (3)· patent assignee history
2015–2017Based in Ube, JP· patent location history
2016Based in Yamaguchi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEM DUPONT MICROSYS32012–2013
MINEGISHI TOMONORI32012–2013
NOGITA RIKAself32012–2013
UBE MAT IND LTD32015–2017
KAWASAKI DAI22012–2013
Locations
LocationPatentsSpan
Ube, JP22015–2017
Ibaraki, JP22012–2013
Yamaguchi, JP12016
Hitachi, JP12012