Inventor
Vi Vuong
Inventor
Fremont, CA, US
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions22%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
G06FElectric digital data processing9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G06NComputing arrangements based on specific computational models3%
H01JElectric discharge tubes or discharge lamps3%
G01RMeasuring electric variables2%
G06TImage data processing or generation, in general2%
PatentTitleYear
10,993,430Robotic plant care systems and methods202110,692,705Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber202010,002,804Method of endpoint detection of plasma etching process using multivariate analysis20189,607,265'Accurate and fast neural network training for library-based critical dimension (CD) metrology'20179,330,990'Method of endpoint detection of plasma etching process using multivariate analysis'20168,577,820'Accurate and fast neural network training for library-based critical dimension (CD) metrology'20138,452,718'Determination of training set size for a machine learning system'20138,346,506'Transforming metrology data from a semiconductor treatment system using multivariate analysis'20138,170,833'Transforming metrology data from a semiconductor treatment system using multivariate analysis'20127,783,669'Data flow management in generating profile models used in optical metrology'20107,765,076'Allocating processing units to processing clusters to generate simulated diffraction signals'20107,765,234'Data flow management in generating different signal formats used in optical metrology'20107,742,888'Allocating processing units to generate simulated diffraction signals used in optical metrology'20107,616,325'Optical metrology optimization for repetitive structures'20097,588,949'Optical metrology model optimization based on goals'20097,525,673'Optimizing selected variables of an optical metrology system'20097,526,354'Managing and using metrology data for process and equipment control'20097,523,021'Weighting function to enhance measured diffraction signals in optical metrology'20097,522,294'Measuring a process parameter of a semiconductor fabrication process using optical metrology'20097,522,295'Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer'20097,515,282'Modeling and measuring structures with spatially varying properties in optical metrology'20097,505,148'Matching optical metrology tools using spectra enhancement'20097,505,153'Model and parameter selection for optical metrology'20097,495,781'Optimizing selected variables of an optical metrology model'20097,474,993'Selection of wavelengths for integrated circuit optical metrology'20097,474,420'In-die optical metrology'20097,467,064'Transforming metrology data from a semiconductor treatment system using multivariate analysis'20087,428,044'Drift compensation for an optical metrology tool'20087,417,750'Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer'20087,394,554'Selecting a hypothetical profile to use in optical metrology'20087,388,677'Optical metrology optimization for repetitive structures'20087,330,279'Model and parameter selection for optical metrology'20087,327,475'Measuring a process parameter of a semiconductor fabrication process using optical metrology'20087,216,045'Selection of wavelengths for integrated circuit optical metrology'20077,171,284'Optical metrology model optimization based on goals'20077,126,700'Parametric optimization of optical metrology model'20067,092,110'Optimized model and parameter selection for optical metrology'20066,853,942'Metrology hardware adaptation with universal library'20056,842,261'Integrated circuit profile value determination'20056,609,086'Profile refinement for integrated circuit metrology'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2009Patents assigned to TIMBRE TECH INC (15)· patent assignee history
2003–2020Based in Fremont, CA, US· patent location history
2008–2020Patents assigned to TOKYO ELECTRON LTD (23)· patent assignee history
2012–2017Patents assigned to VUONG VI (5)· patent assignee history
2012–2017Patents assigned to BAO JUNWEI (4)· patent assignee history
2013–2017Patents assigned to JIN WEN (3)· patent assignee history
2021Based in Davis, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 23 | 2008–2020 |
| TIMBRE TECH INC | 15 | 2003–2009 |
| VUONG VIself | 5 | 2012–2017 |
| BAO JUNWEI | 4 | 2012–2017 |
| JIN WEN | 3 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 39 | 2003–2020 |
| Davis, California, US | 1 | 2021 |