Inventor
Eun-ha Lee
Inventor
Seoul, KR
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
H01LSemiconductor devices9%
H10BElectronic memory devices5%
B08BCleaning in general4%
B82YSpecific uses or applications of nanostructures4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B60LPropulsion of electrically-propelled vehicles3%
B60TVehicle brake control systems or parts thereof3%
PatentTitleYear
10,857,891Electronic brake system202010,343,528Vehicle control apparatus and control method thereof201910,217,651Washing device20199,425,323'Thin film, method of forming thin film, semiconductor device including thin film, and method of manufacturing semiconductor device'20169,362,146'Washing device'20169,316,789'Semiconductor devices and methods of manufacturing the same'20169,190,270'Low-defect semiconductor device and method of manufacturing the same'20159,110,233'Semiconductor devices'20159,059,222'Washing device and method for fabricating the same'20158,993,420'Methods of forming epitaxial layers'20158,618,543'Thin film transistor including selectively crystallized channel layer and method of manufacturing the thin film transistor'20138,574,819'Method for forming fine pattern'20138,555,460'Apparatus for cleaning substrate'20138,440,527'Memory device and method of fabricating the same'20138,426,852'Transistors and electronic apparatuses including same'20138,343,879'Method for forming isolation layer of semiconductor device'20138,300,851'Method of managing sound source and apparatus therefor'20128,294,198'Semiconductor integrated circuit device and method of fabricating the same'20128,137,881'Electrophotographic toner'20128,053,366'Al-doped charge trap layer and non-volatile memory device including the same'20118,043,952'Method of forming aluminum oxide layer and method of manufacturing charge trap memory device using the same'20117,995,162'Liquid crystal display device and method for manufacturing the same'20117,964,908'Memory devices comprising nano region embedded dielectric layers'20117,935,964'Oxide semiconductors and thin film transistors comprising the same'20117,919,365'Fabrication methods of a ZnO thin film structure and a ZnO thin film transistor, and a ZnO thin film structure and a ZnO thin film transistor'20117,838,422'Al-doped charge trap layer, non-volatile memory device and methods of fabricating the same'20106,333,251'Method of fabricating gate structure of semiconductor device for repairing damage to gate oxide layer'20016,245,620'Method for foaming MOS transistor having bi-layered spacer'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2016Patents assigned to SAMSUNG ELECTRONICS CO LTD (19)· patent assignee history
2001–2020Based in Chungcheongnam-do, KR· patent location history
2001–2012Based in Suwon-si, KR· patent location history
2010–2016Based in Seoul, KR· patent location history
2011–2019Patents assigned to LG DISPLAY CO LTD (5)· patent assignee history
2011–2015Based in Gyeonggi-do, KR· patent location history
2012–2013Patents assigned to LEE EUN-HA (9)· patent assignee history
2012–2013Patents assigned to CHOI HAN-MEI (2)· patent assignee history
2012–2013Patents assigned to HEO SUNG (2)· patent assignee history
2016–2019Based in Paju-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 19 | 2001–2016 |
| LEE EUN-HAself | 9 | 2012–2013 |
| LG DISPLAY CO LTD | 5 | 2011–2019 |
| CHOI HAN-MEI | 2 | 2012–2013 |
| HEO SUNG | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 16 | 2010–2016 |
| Gyeonggi-do, KR | 5 | 2011–2015 |
| Chungcheongnam-do, KR | 2 | 2001–2020 |
| Paju-si, KR | 2 | 2016–2019 |
| Suwon-si, KR | 2 | 2001–2012 |