Inventor

Shu Ogawa

Inventor
Tokyo, JP

Overview

14→
Patents
1993–2006
Patent span
Physics
Primary field (CPC G)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
B22DCasting of metals15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G03DApparatus for processing exposed photographic materials7%
Y10TTechnical subjects covered by former us classification7%
B01DSeparation4%
B01FMixing, e.g. dissolving, emulsifying or dispersing4%
B08BCleaning in general4%
C09GPolishing compositions4%
C23FNon-mechanical removal of metallic material from surface4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2005Patents assigned to NAGASE & CO LTD (8)· patent assignee history
1993–2001Based in Nagareyama, JP· patent location history
1997–2001Patents assigned to HIRAMA RIKA KENKYUJO LTD (3)· patent assignee history
1998–1999Patents assigned to BHP STEEL JLA PTY LTD (3)· patent assignee history
1998–2006Patents assigned to ISHIKAWAJIMA HARIMA HEAVY IND (3)· patent assignee history
1998–1999Based in Yokohama, JP· patent location history
1999Based in Yokahama, JP· patent location history
2003–2006Patents assigned to NAGASE CMS TECHNOLOGY CO LTD (6)· patent assignee history
2003–2006Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAGASE & CO LTD81993–2005
NAGASE CMS TECHNOLOGY CO LTD62003–2006
BHP STEEL JLA PTY LTD31998–1999
HIRAMA RIKA KENKYUJO LTD31997–2001
ISHIKAWAJIMA HARIMA HEAVY IND31998–2006
Locations
LocationPatentsSpan
Tokyo, JP72003–2006
Nagareyama, JP41993–2001
Yokohama, JP21998–1999
Yokahama, JP11999