Inventor
Martijn Maria Zaal
Inventor
Veldhoven, NL
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G06FElectric digital data processing20%
G01BMeasuring length, thickness or similar linear dimensions10%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
H01LSemiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
PatentTitleYear
11,022,897Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets202110,811,323Method and apparatus to determine a patterning process parameter202010,585,354Method of optimizing a metrology process202010,520,830Method and device for determining adjustments to sensitivity parameters2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019–2021Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2019–2021Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2019–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 4 | 2019–2021 |