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Inventor

Shohei OTOMO

Inventor
JP

Overview

2→
Patents
2025–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H01JElectric discharge tubes or discharge lamps33%
B22FWorking metallic powder17%
C22CAlloys17%
PatentTitleYear
12,522,913Sputtering target202612,340,995Ruthenium-based sputtering target and method for manufacturing same2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to FURUYA METAL CO LTD (2)· patent assignee history
2025–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FURUYA METAL CO LTD22025–2026
Locations
LocationPatentsSpan
JP22025–2026