Inventor
Hirotomo KAWAHARA
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C23CCoating metallic material6%
PatentTitleYear
12,298,660Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same202512,235,575Reflective mask blank for EUV lithography and substrate with conductive film202512,216,397Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof202512,038,685Reflective mask blank for EUV lithography202411,982,935Reflective mask blank for EUV lithography202411,953,822Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same202411,934,093Reflective mask blank for EUV lithography and substrate with conductive film202411,822,229Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof202311,698,580Reflective mask blank for EUV lithography2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to AGC INC (9)· patent assignee history
2023–2025Based in JP· patent location history
2024Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGC INC | 9 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 8 | 2023–2025 |
| US | 1 | 2024 |