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Inventor

Norimasa Nagase

Inventor
Kawasaki, JP

Overview

2→
Patents
2013–2014
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G06FElectric digital data processing33%
PatentTitleYear
8,739,075'Method of making pattern data, and medium for storing the program for making the pattern data'20148,365,105'Method of performing optical proximity effect corrections to photomask pattern'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to FUJITSU SEMICONDUCTOR LTD (2)· patent assignee history
2013–2014Patents assigned to NAGASE NORIMASA (2)· patent assignee history
2013–2014Patents assigned to SUZUKI KOICHI (2)· patent assignee history
2013Patents assigned to MINEMURA MASAHIKO (1)· patent assignee history
2013Based in Yokohama, JP· patent location history
2014Patents assigned to SAITO MUNETO (1)· patent assignee history
2014Based in Kawasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJITSU SEMICONDUCTOR LTD22013–2014
NAGASE NORIMASAself22013–2014
SUZUKI KOICHI22013–2014
MINEMURA MASAHIKO12013
SAITO MUNETO12014
Locations
LocationPatentsSpan
Kawasaki, JP12014
Yokohama, JP12013