Inventor

Seiko Hitomi

Inventor

Tokyo, JP

Overview

2017

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary

B82YSpecific uses or applications of nanostructures13%

G01BMeasuring length, thickness or similar linear dimensions13%

G01NInvestigating or analysing materials by determining their chemical or physical properties13%

G06KGraphical data reading13%

G06TImage data processing or generation, in general13%

H01JElectric discharge tubes or discharge lamps13%

H01LSemiconductor devices13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to CHENG ZHAOHUI (1)· patent assignee history

2017Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history

2017Patents assigned to HITOMI SEIKO (1)· patent assignee history

2017Patents assigned to KAWADA HIROKI (1)· patent assignee history

2017Patents assigned to OHASHI TAKEYOSHI (1)· patent assignee history

2017Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Tokyo, JP	1	2017