Inventor
Michael Arnz
Inventor
Oberkochen, DE
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
G01BMeasuring length, thickness or similar linear dimensions9%
G01MTesting static or dynamic balance of machines or structures6%
G02BOptical elements, systems or apparatus6%
G06TImage data processing or generation, in general6%
B82YSpecific uses or applications of nanostructures3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G06FElectric digital data processing3%
G06KGraphical data reading3%
PatentTitleYear
10,113,864Method for determining the registration of a structure on a photomask and apparatus to perform the method201810,012,911Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator20189,797,805'Test object for measuring the point spread function of an optical system'20179,786,046'Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position'20179,377,415'Measuring device for measuring an illumination property'20169,303,975'Method for determining the registration of a structure on a photomask and apparatus to perform the method'20169,297,994'Grating-assisted autofocus device and autofocusing method for an imaging device'20169,229,209'Autofocus device and autofocusing method for an imaging device'20169,014,505'Method and device for determining the position of a first structure relative to a second structure or a part thereof'20158,731,273'Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section'20148,693,805'Determination of the relative position of two structures'20148,694,929'Method and apparatus for the position determination of structures on a mask for microlithography'20148,473,237'Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage'20138,457,411'Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure'20138,369,605'Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier'20138,260,033'Method and apparatus for determining the relative overlay shift of stacked layers'20128,218,148'Method and apparatus for measuring scattered light on an optical system'20127,755,748'Device and method for range-resolved determination of scattered light, and an illumination mask'20107,408,631'Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask'20086,816,247'Moir method and a system for measuring the distortion of an optical imaging system'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2018Based in Oberkochen, DE· patent location history
2012–2016Patents assigned to ARNZ MICHAEL (12)· patent assignee history
2012–2018Patents assigned to ZEISS CARL SMT GMBH (11)· patent assignee history
2012–2016Patents assigned to ZEISS CARL SMS GMBH (9)· patent assignee history
2012–2016Patents assigned to KLOSE GERD (5)· patent assignee history
2014–2016Patents assigned to SEIDEL DIRK (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ARNZ MICHAELself | 12 | 2012–2016 |
| ZEISS CARL SMT GMBH | 11 | 2012–2018 |
| ZEISS CARL SMS GMBH | 9 | 2012–2016 |
| KLOSE GERD | 5 | 2012–2016 |
| SEIDEL DIRK | 4 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oberkochen, DE | 20 | 2004–2018 |