Inventor
MAURITS VAN DER SCHAAR
Inventor
NL
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G01BMeasuring length, thickness or similar linear dimensions13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G01RMeasuring electric variables4%
G06FElectric digital data processing4%
H01LSemiconductor devices4%
G06TImage data processing or generation, in general2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
12,510,829Method and apparatus for design of a metrology target202512,429,328Metrology method, target and substrate202512,321,101Method for applying a deposition model in a semiconductor manufacturing process202512,276,921Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method202512,242,203Target for measuring a parameter of a lithographic process202512,204,826Method and apparatus for inspection and metrology202512,105,432Metrology method and associated computer product202412,066,764Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202412,019,377Target for measuring a parameter of a lithographic process202411,982,946Metrology targets202411,709,436Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202311,698,346Methods and apparatus for monitoring a manufacturing process, inspection apparatus, lithographic system, device manufacturing method202311,580,274Method and apparatus for inspection and metrology202311,525,786Method and apparatus for angular-resolved spectroscopic lithography characterization202211,480,884Method for optimization of a lithographic process202211,466,980Metrology method and apparatus, lithographic system, device manufacturing method and substrate202211,428,521Metrology method, target and substrate202211,429,029Method and apparatus for illumination adjustment202211,392,044Method of determining a position of a feature202211,385,553Metrology method, patterning device, apparatus and computer program202211,320,745Measuring a process parameter for a manufacturing process involving lithography202211,221,560Method and apparatus for design of a metrology target202211,204,239Metrology method, target and substrate202111,187,995Metrology using a plurality of metrology target measurement recipes2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (24)· patent assignee history
2021–2025Based in NL· patent location history
2024Patents assigned to ASML HOLDING NV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 24 | 2021–2025 |
| ASML HOLDING NV | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 24 | 2021–2025 |