Inventor
Kiyohito Yamamoto
Inventor
Tochigi, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G01BMeasuring length, thickness or similar linear dimensions15%
B05DProcesses for applying fluent materials to surfaces, in general8%
G05BControl or regulating systems in general8%
H01LSemiconductor devices8%
H05KPrinted circuits8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y02PClimate change mitigation technologies in the production or processing of goods8%
PatentTitleYear
10,672,673Method of performing analysis of pattern defect, imprint apparatus, and article manufacturing method20209,386,707'Circuit substrate and method of forming circuit pattern'20167,834,982'Substrate holder and exposure apparatus having the same'20107,298,482'Exposure apparatus and aligning method'20077,295,287'Substrate holder and exposure apparatus having the same'20076,952,262'Exposure apparatus and aligning method'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2020Patents assigned to CANON KK (5)· patent assignee history
2005–2010Based in Tochigi, JP· patent location history
2016Patents assigned to TORAY ELECTRONICS CO LTD (1)· patent assignee history
2016Patents assigned to TORAY ENG CO LTD (1)· patent assignee history
2016Based in Otsu, JP· patent location history
2020Based in Utsunomiya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 5 | 2005–2020 |
| TORAY ELECTRONICS CO LTD | 1 | 2016 |
| TORAY ENG CO LTD | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tochigi, JP | 4 | 2005–2010 |
| Utsunomiya, JP | 1 | 2020 |
| Otsu, JP | 1 | 2016 |