Inventor
Junji Isohata
Inventor
Tokyo, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices68%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
F16CShafts3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
7,193,684'Projection exposure mask, projection exposure apparatus, and projection exposure method'20077,158,210'Projection exposure apparatus'20077,030,962'Projection exposure mask, projection exposure apparatus, and projection exposure method'20065,359,389'Exposure apparatus including two illuminating systems and exposure process using the same'19945,150,152'Exposure apparatus including device for determining movement of an object'19924,998,134'Exposure apparatus'19914,878,086'Flat panel display device and manufacturing of the same'19894,864,360'Exposure apparatus'19894,814,830'Flat panel display device and manufacturing of the same'19894,768,064'Conveyor device for alignment'19884,749,867'Exposure apparatus'19884,748,477'Exposure apparatus'19884,737,824'Surface shape controlling device'19884,708,466'Exposure apparatus'19874,708,465'Exposure apparatus'19874,676,630'Exposure apparatus'19874,601,560'Focus adjustment in an alignment and exposure apparatus'19864,588,288'Static pressure bearing and transport device utilizing the same'19864,563,820'Aligning system'19864,496,239'Projection exposure apparatus'19854,422,754'Projection-printing apparatus'19834,407,627'Automatic wafer orienting apparatus'19834,370,054'Projection exposure apparatus'19833,982,627'Automatic wafer orienting apparatus'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2007Patents assigned to CANON KK (24)· patent assignee history
1976–2007Based in Tokyo, JP· patent location history
1983Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 24 | 1976–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 23 | 1976–2007 |
| Kawasaki, JP | 1 | 1983 |