Inventor
Seyed Jafar Jafarian-Tehrani
Inventor
Fremont, CA, US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
H05HPlasma technique13%
H03HImpedance networks, e.g. resonant circuits12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G01RMeasuring electric variables8%
Y10TTechnical subjects covered by former us classification7%
C23CCoating metallic material3%
G05BControl or regulating systems in general3%
H01RElectrically-conductive connections3%
C23FNon-mechanical removal of metallic material from surface2%
PatentTitleYear
10,812,033High-power radio-frequency spiral-coil filter202010,690,727Identifying components associated with a fault in a plasma system202010,381,201Control of etch rate using modeling, feedback and impedance match20199,851,389Identifying components associated with a fault in a plasma system20179,720,022'Systems and methods for providing characteristics of an impedance matching model for use with matching networks'20179,620,334'Control of etch rate using modeling, feedback and impedance match'20179,312,832'High power filter with single adjust for multiple channels'20169,305,750'Adjusting current ratios in inductively coupled plasma processing systems'20169,074,285'Systems for detecting unconfined-plasma events'20158,894,804'Plasma unconfinement sensor and methods thereof'20148,742,666'Radio frequency (RF) power filters and plasma processing systems including RF power filters'20148,736,175'Current control in plasma processing systems'20148,466,697'Arrangements for detecting discontinuity of flexible connections for current flow and methods thereof'20138,315,029'ESC high voltage control and methods thereof'20127,983,018'Plasma processing system ESC high voltage control and methods thereof'20117,768,766'Plasma processing system ESC high voltage control'20107,435,926'Methods and array for creating a mathematical model of a plasma processing system'20086,919,689'Method for toolmatching and troubleshooting a plasma processing system'20056,873,114'Method for toolmatching and troubleshooting a plasma processing system'20056,563,076'Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor'20036,509,542'Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor'20035,824,606'Methods and apparatuses for controlling phase difference in plasma processing systems'19985,812,361'Dynamic feedback electrostatic wafer chuck'19985,708,250'Voltage controller for electrostatic chuck of vacuum plasma processors'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2020Patents assigned to LAM RES CORP (23)· patent assignee history
1998–2020Based in Fremont, CA, US· patent location history
2012–2016Patents assigned to JAFARIAN-TEHRANI SEYED JAFAR (7)· patent assignee history
2014–2016Patents assigned to LONG MAOLIN (3)· patent assignee history
2014Patents assigned to ALBAREDE LUC (1)· patent assignee history
2014Patents assigned to ANDERSON THOMAS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 23 | 1998–2020 |
| JAFARIAN-TEHRANI SEYED JAFARself | 7 | 2012–2016 |
| LONG MAOLIN | 3 | 2014–2016 |
| ALBAREDE LUC | 1 | 2014 |
| ANDERSON THOMAS | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 24 | 1998–2020 |