Inventor
Li-po YANG
Inventor
TW
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds27%
C09DCoating compositions, e.g. paints, varnishes or lacquers27%
PatentTitleYear
12,566,374Photoresist composition and method of manufacturing semiconductor device202612,510,821Photoresist composition and method of forming photoresist pattern202512,189,287Photoresist composition and method of forming photoresist pattern202511,714,355Photoresist composition and method of forming photoresist pattern202311,550,220Negative tone photoresist for EUV lithography2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (5)· patent assignee history
2023–2026Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 5 | 2023–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 5 | 2023–2026 |