Inventor
Shuwei Sun
Inventor
Framingham, MA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material15%
B22FWorking metallic powder12%
C22CAlloys12%
Y10TTechnical subjects covered by former us classification12%
G06FElectric digital data processing10%
C03CChemical composition of glasses, glazes or vitreous enamels8%
H01JElectric discharge tubes or discharge lamps8%
C23FNon-mechanical removal of metallic material from surface4%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
PatentTitleYear
10,829,849Molybdenum containing targets202010,403,483Molybdenum containing targets20199,945,023Touch screen device comprising Mo-based film layer and methods thereof20189,929,187'Copper-alloy capping layers for metallization in touch-panel displays'20189,837,253Molybdenum containing targets for touch screen device20179,783,882'Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom'20179,299,472'Copper-alloy barrier layers for metallization in thin-film transistors and flat panel displays'20169,150,955'Method of making molybdenum containing targets comprising molybdenum, titanium, and tantalum or chromium'20159,017,762'Method of making molybdenum-containing targets comprising three metal elements'20158,883,250'Methods of rejuvenating sputtering targets'20148,491,959'Methods of rejuvenating sputtering targets'20138,449,817'Molybdenum-containing targets comprising three metal elements'20138,449,818'Molybdenum containing targets'20138,197,894'Methods of forming sputtering targets'20127,850,876'Tin oxide-based sputtering target, transparent and conductive films, method for producing such films and composition for use therein'20107,452,488'Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to STARCK H C INC (15)· patent assignee history
2008–2020Based in Framingham, MA, US· patent location history
2012–2018Patents assigned to SUN SHUWEI (6)· patent assignee history
2012–2017Patents assigned to STARCK H C GMBH (3)· patent assignee history
2013Patents assigned to GAYDOS MARK E (2)· patent assignee history
2016–2018Patents assigned to ABOUAF MARC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| STARCK H C INC | 15 | 2008–2020 |
| SUN SHUWEIself | 6 | 2012–2018 |
| STARCK H C GMBH | 3 | 2012–2017 |
| ABOUAF MARC | 2 | 2016–2018 |
| GAYDOS MARK E | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Framingham, Massachusetts, US | 16 | 2008–2020 |