Inventor
Qun Ying Lin
Inventor
Singapore, SG
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
A61BDiagnosis10%
G06FElectric digital data processing10%
A61KPreparations for medical, dental or toiletry purposes6%
A61LMethods or apparatus for sterilising materials or objects in general6%
A61NElectrotherapy6%
B82YSpecific uses or applications of nanostructures6%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms3%
C12YEnzymes3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
11,119,812Method and device for processing application program page according to a common interface container202111,057,440Method for processing message in group session, storage medium, and computer device202111,048,601Disk data reading/writing method and device202111,004,563Adaptive pain management and reduction based on monitoring user conditions202110,954,544Biosensor for multi-analyte characterization202110,926,079Neuro-stem cell stimulation and growth enhancement with implantable nanodevice202110,918,852Neuro-stem cell stimulation and growth enhancement with implantable nanodevice202110,631,824Medical body surface sticking ultrasonic probe20209,034,720'Litho scanner alignment signal improvement'20158,741,511'Determination of lithography tool process condition'20148,057,968'Mask and method to pattern chromeless phase lithography contact hole'20117,866,224'Monitoring structure'20117,655,388'Mask and method to pattern chromeless phase lithography contact hole'20107,288,366'Method for dual damascene patterning with single exposure using tri-tone phase shift mask'20077,014,962'Half tone alternating phase shift masks'20066,451,706'Attenuation of reflecting lights by surface treatment'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2011Patents assigned to CHARTERED SEMICONDUCTOR MFG (5)· patent assignee history
2002–2015Based in Singapore, SG· patent location history
2011–2015Patents assigned to GLOBALFOUNDRIES SG PTE LTD (3)· patent assignee history
2011–2015Patents assigned to LIN QUN YING (2)· patent assignee history
2020–2021Based in Shenzhen, CN· patent location history
2021Patents assigned to IBM (4)· patent assignee history
2021Patents assigned to TENCENT TECH SHENZHEN CO LTD (2)· patent assignee history
2021Based in Yorktown Heights, NY, US· patent location history
2021Based in Zhejiang, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHARTERED SEMICONDUCTOR MFG | 5 | 2002–2011 |
| IBM | 4 | 2021 |
| GLOBALFOUNDRIES SG PTE LTD | 3 | 2011–2015 |
| LIN QUN YINGself | 2 | 2011–2015 |
| TENCENT TECH SHENZHEN CO LTD | 2 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Singapore, SG | 8 | 2002–2015 |
| Yorktown Heights, New York, US | 4 | 2021 |
| Shenzhen, CN | 3 | 2020–2021 |
| Zhejiang, CN | 1 | 2021 |