Inventor
Rin Odashima
Inventor
Tokyo, JP
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general14%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form14%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08LCompositions of macromolecular compounds14%
C09DCoating compositions, e.g. paints, varnishes or lacquers14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to TOKYO INST TECH (1)· patent assignee history
2021Patents assigned to TOKYO OHKA KOGYO CO LTD (1)· patent assignee history
2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO INST TECH | 1 | 2021 |
| TOKYO OHKA KOGYO CO LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 1 | 2021 |