Inventor
Roger E. Moody
Inventor
Rochester, NY, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests45%
C07DHeterocyclic compounds9%
PatentTitleYear
4,859,572'Dye sensitized photographic imaging system'19894,743,529'Negative working photoresists responsive to shorter visible wavelengths and novel coated articles'19884,743,528'Enhanced imaging composition containing an azinium activator'19884,743,530'Negative working photoresists responsive to longer wavelengths and novel coated articles'19884,743,531'Dye sensitized photographic imaging system'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1989Patents assigned to EASTMAN KODAK CO (5)· patent assignee history
1988–1989Based in Rochester, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 5 | 1988–1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 5 | 1988–1989 |