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Inventor

VINCENT J. LARAIA

Inventor
US

Overview

2→
Patents
2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing22%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B24DTools for grinding, buffing or sharpening11%
G05BControl or regulating systems in general11%
G06NComputing arrangements based on specific computational models11%
PatentTitleYear
12,487,566Polishing semiconductor wafers using causal models202512,370,649Abrasive elements with precisely shaped features, abrasive articles fabricated therefrom and methods of making thereof2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to 3M INNOVATIVE PROPERTIES COMPANY (2)· patent assignee history
2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
3M INNOVATIVE PROPERTIES COMPANY22025
Locations
LocationPatentsSpan
US22025