Inventor
Nobutaka Fukunaga
Inventor
Koshi, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
H01LSemiconductor devices22%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G06TImage data processing or generation, in general11%
PatentTitleYear
10,527,948Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium202010,274,843Exposure apparatus, exposure method and storage medium20198,774,491'Substrate processing apparatus, substrate processing method, and computer-readable recording medium having program for executing the substrate processing method recorded therein'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2020Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2014Patents assigned to FUKUNAGA NOBUTAKA (1)· patent assignee history
2014Patents assigned to SEKI SHINICHI (1)· patent assignee history
2014Patents assigned to SOHARA TOSHIFUMI (1)· patent assignee history
2014Patents assigned to TOMITA HIROSHI (1)· patent assignee history
2014–2020Based in Koshi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 3 | 2014–2020 |
| FUKUNAGA NOBUTAKAself | 1 | 2014 |
| SEKI SHINICHI | 1 | 2014 |
| SOHARA TOSHIFUMI | 1 | 2014 |
| TOMITA HIROSHI | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 3 | 2014–2020 |