Inventor
Thomas R. Glass
Inventor
Idaho City, ID, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
Y10TTechnical subjects covered by former us classification10%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
F01BMachines or engines, in general or of positive-displacement type, e.g. steam engines4%
F01LCyclically operating valves for machines or engines4%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
7,576,400'Circuitry and gate stacks'20097,387,866'Photolithography process using multiple anti-reflective coatings'20087,315,074'Use of DAR coating to modulate the efficiency of laser fuse blows'20087,250,247'Photolithographic structures using multiple anti-reflecting coatings'20077,167,156'Electrowetting display'20077,091,050'Solid phase assay for detection of ligands'20066,900,515'Use of DAR coating to modulate the efficiency of laser fuse blows'20056,664,114'Solid phase assay for detection of ligands'20036,605,502'Isolation using an antireflective coating'20036,495,450'Isolation using an antireflective coating'20026,461,950'Semiconductor processing methods, semiconductor circuitry, and gate stacks'20026,423,631'Isolation using an antireflective coating'20026,423,582'Use of DAR coating to modulate the efficiency of laser fuse blows'20026,331,379'Photo-lithography process using multiple anti-reflective coatings'20016,281,100'Semiconductor processing methods'20016,191,040'Wafer surface treatment methods and systems using electrocapillarity'20016,187,484'Irradiation mask'20016,174,590'Isolation using an antireflective coating'20016,121,133'Isolation using an antireflective coating'20006,010,964'Wafer surface treatment methods and systems using electrocapillarity'20006,008,057'Immunoassay system'19995,565,365'Assay flow apparatus and method'19965,129,414'Expansible chamber device having variably restrained valve systems'19925,111,843'Expansible chamber device having variably restrained valve systems'19924,981,068'Expansible chamber device having variably restrained valve systems'19914,909,990'Immunoassay apparatus'19904,844,869'Immunoassay apparatus'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989Based in Belmont, MA, US· patent location history
1990Patents assigned to BLOCK MYRON J (1)· patent assignee history
1990Based in Watertown, MA, US· patent location history
1991–1992Patents assigned to GLASS THOMAS R (3)· patent assignee history
1991–1992Patents assigned to HUDSON WELDON R (3)· patent assignee history
1991–1992Based in Pflugerville, TX, US· patent location history
1996–2009Based in Idaho City, ID, US· patent location history
2000–2009Patents assigned to MICRON TECHNOLOGY INC (18)· patent assignee history
2003–2006Patents assigned to SAPIDYNE INSTR INC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 18 | 2000–2009 |
| GLASS THOMAS Rself | 3 | 1991–1992 |
| HUDSON WELDON R | 3 | 1991–1992 |
| SAPIDYNE INSTR INC | 2 | 2003–2006 |
| BLOCK MYRON J | 1 | 1990 |
Locations
| Location | Patents | Span |
|---|---|---|
| Idaho City, ID, US | 22 | 1996–2009 |
| Pflugerville, Texas, US | 3 | 1991–1992 |
| Watertown, Massachusetts, US | 1 | 1990 |
| Belmont, Massachusetts, US | 1 | 1989 |