Inventor
Shunji Maeda
Inventor
Yokohama, JP
Overview
Patents· 167 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties42%
G06TImage data processing or generation, in general18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
G02BOptical elements, systems or apparatus4%
H01JElectric discharge tubes or discharge lamps3%
G01RMeasuring electric variables3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G06FElectric digital data processing3%
G01BMeasuring length, thickness or similar linear dimensions3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
10,554,910Solid state image sensor, semiconductor device, and electronic device20209,933,338Health management system, fault diagnosis system, health management method, and fault diagnosis method20189,779,495'Anomaly diagnosis method and apparatus'20179,733,194'Method for reviewing a defect and apparatus'20179,659,250'Facility state monitoring method and device for same'20179,483,049'Anomaly detection and diagnosis/prognosis method, anomaly detection and diagnosis/prognosis system, and anomaly detection and diagnosis/prognosis program'20168,824,774'Method and apparatus for inspecting patterns formed on a substrate'20148,811,712'Defect inspection method and device thereof'20148,755,041'Defect inspection method and apparatus'20148,748,795'Method for inspecting pattern defect and device for realizing the same'20148,682,824'Method and device for monitoring the state of a facility'20148,681,328'Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus'20148,660,340'Defect classification method and apparatus, and defect inspection apparatus'20148,654,350'Inspecting method and inspecting apparatus for substrate surface'20148,643,834'Apparatus of inspecting defect in semiconductor and method of the same'20148,639,019'Method and apparatus for inspecting pattern defects'20148,634,069'Defect inspection device and defect inspection method'20148,630,962'Error detection method and its system for early detection of errors in a planar or facilities'20148,620,061'Visual inspection method and apparatus and image analysis system'20138,582,864'Fault inspection method'20138,553,214'Method and equipment for detecting pattern defect'20138,467,594'Method and apparatus for inspecting patterns formed on a substrate'20138,462,330'Method and apparatus for detecting defects'20138,437,534'Defect classification method and apparatus, and defect inspection apparatus'20138,427,634'Defect inspection method and apparatus'20138,410,460'Pattern defect inspection method and its apparatus'20138,355,123'Defect inspection apparatus and its method'20138,340,395'Defect inspection method and apparatus therefor'20128,310,666'Apparatus of inspecting defect in semiconductor and method of the same'20128,310,665'Inspecting method and inspecting apparatus for substrate surface'20128,275,190'Method and apparatus for inspecting pattern defects'20128,274,652'Defect inspection system and method of the same'20128,270,700'Method and apparatus for pattern inspection'20128,253,934'Method and apparatus for inspecting a pattern formed on a substrate'20128,228,494'Apparatus for inspecting defects'20128,218,138'Apparatus and method for inspecting defects'20128,149,396'Defect inspection apparatus and its method'20128,144,337'Inspecting method and inspecting apparatus for substrate surface'20128,139,841'Visual inspection method and apparatus and image analysis system'20128,107,717'Defect inspection method and apparatus'20128,107,065'Method and apparatus for detecting defects'20128,103,087'Fault inspection method'20128,090,187'Pattern inspection method and its apparatus'20128,045,149'Apparatus for detecting defects using multiple coordinate systems'20118,005,292'Method and apparatus for inspecting pattern defects'20118,004,666'Apparatus for inspecting defects'20117,987,033'Method for determining the morphology of an occupant in an automotive seat with capacitive sensors'20117,973,920'Apparatus and method for inspecting defects'20117,962,311'Method using capacitive sensors for morphology discrimination of a passenger seating in an automotive seat'20117,952,074'Method and apparatus for inspecting integrated circuit pattern'20117,952,699'Apparatus of inspecting defect in semiconductor and method of the same'20117,949,178'Pattern inspection method and its apparatus'20117,940,385'Defect inspection apparatus and its method'20117,916,929'Defect inspection method and apparatus'20117,903,249'Method and apparatus for inspecting pattern defects'20117,895,014'Method for improving the localisation of a target in regard of a sensor'20117,869,966'Inspection method and its apparatus, inspection system'20117,851,753'Method and apparatus for reviewing defects'20107,848,563'Method and apparatus for inspecting a defect of a pattern'20107,834,992'Method and its apparatus for detecting defects'20107,826,047'Apparatus and method for optical inspection'20107,792,352'Method and apparatus for inspecting pattern defects'20107,791,725'Method and equipment for detecting pattern defect'20107,768,635'Apparatus and method for inspecting defects'20107,751,036'Apparatus of inspecting defect in semiconductor and method of the same'20107,751,037'Method and apparatus for detecting defects'20107,714,997'Apparatus for inspecting defects'20107,711,178'Pattern inspection method and its apparatus'20107,664,608'Defect inspection method and apparatus'20107,646,477'Method and apparatus for inspecting a pattern formed on a substrate'20107,620,232'Method and apparatus for pattern inspection'20097,599,545'Method and its apparatus for inspecting defects'20097,528,942'Method and apparatus for detecting defects'20097,512,259'Defect inspection method and apparatus'20097,508,973'Method of inspecting defects'20097,499,162'Method and apparatus for observing and inspecting defects'20097,489,395'Method and apparatus for inspecting pattern defects'20097,474,394'Apparatus of inspecting defect in semiconductor and method of the same'20097,465,935'Method for inspecting pattern defect and device for realizing the same'20087,463,350'Method and apparatus for detecting defects of a sample using a dark field signal and a bright field signal'20087,460,220'Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected'20087,456,963'Method and equipment for detecting pattern defect'20087,440,092'Method and apparatus for detecting defects'20087,433,508'Pattern inspection method and its apparatus'20087,417,444'Method and apparatus for inspecting integrated circuit pattern'20087,400,393'Method and apparatus for detecting defects in a specimen utilizing information concerning the specimen'20087,388,979'Method and apparatus for inspecting pattern defects'20087,372,561'Method and apparatus for inspecting defects and a system for inspecting defects'20087,359,044'Method and apparatus for inspecting pattern defects'20087,333,192'Apparatus and method for inspecting defects'20087,333,677'Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections'20087,330,248'Method and apparatus for inspecting defects'20087,305,015'Ultraviolet laser-generating device and defect inspection apparatus and method therefor'20077,299,147'Systems for managing production information'20077,295,305'Method and its apparatus for inspecting a pattern'20077,274,813'Defect inspection method and apparatus'20077,271,908'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'20077,271,892'Method and apparatus for inspecting defects'20077,251,024'Defect inspection method and apparatus therefor'20077,231,079'Method and system for inspecting electronic circuit pattern'20077,221,486'Method and apparatus for picking up 2D image of an object to be sensed'20077,218,389'Method and apparatus for inspecting pattern defects'20077,205,549'Pattern defect inspection method and its apparatus'20077,180,584'Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected'20077,173,693'Method for inspecting defects and an apparatus of the same'20077,161,671'Method and apparatus for inspecting defects'20077,142,708'Defect detection method and its apparatus'20067,142,294'Method and apparatus for detecting defects'20067,132,669'Method and equipment for detecting pattern defect'20067,127,126'Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections'20067,110,105'Method and apparatus for inspecting pattern defects'20067,092,095'Method and apparatus for observing and inspecting defects'20067,061,600'Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected'20067,026,830'Method and apparatus for inspecting integrated circuit pattern'20067,020,350'Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections'20066,996,193'Timing error detection circuit, demodulation circuit and methods thereof'20066,947,587'Defect inspection method and apparatus'20056,943,876'Method and apparatus for detecting pattern defects'20056,927,847'Method and apparatus for inspecting pattern defects'20056,921,905'Method and equipment for detecting pattern defect'20056,900,888'Method and apparatus for inspecting a pattern formed on a substrate'20056,897,956'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'20056,879,392'Method and apparatus for inspecting defects'20056,850,320'Method for inspecting defects and an apparatus for the same'20056,841,403'Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data'20056,819,416'Defect inspection method and apparatus therefor'20046,806,970'Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same'20046,800,859'Method and equipment for detecting pattern defect'20046,797,526'Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect data'20046,799,130'Inspection method and its apparatus, inspection system'20046,765,201'Ultraviolet laser-generating device and defect inspection apparatus and method therefor'20046,762,831'Method and apparatus for inspecting defects'20046,753,972'Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same'20046,721,047'Method and apparatus for inspecting defects of a specimen'20046,690,469'Method and apparatus for observing and inspecting defects'20046,674,890'Defect inspection method and apparatus therefor'20046,654,112'Apparatus and method for inspecting defects'20036,621,571'Method and apparatus for inspecting defects in a patterned specimen'20036,587,581'Visual inspection method and apparatus therefor'20036,566,671'Microscopic defect inspection apparatus and method thereof, as well as positional shift calculation circuit therefor'20036,559,663'Method and apparatus for inspecting integrated circuit pattern'20036,556,290'Defect inspection method and apparatus therefor'20036,507,417'Method and apparatus for picking up 2D image of an object to be sensed'20036,456,951'Method and apparatus for processing inspection data'20026,404,498'Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected'20026,400,454'Apparatus and method for inspector defects'20026,376,854'Method of inspecting a pattern on a substrate'20026,329,826'Method and apparatus for inspecting integrated circuit pattern'20016,317,512'Pattern checking method and checking apparatus'20016,263,099'Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected'20016,236,057'Method of inspecting pattern and apparatus thereof with a differential brightness image detection'20016,172,363'Method and apparatus for inspecting integrated circuit pattern'20016,169,282'Defect inspection method and apparatus therefor'20016,128,352'Receiving apparatus for performing digital broadcast channel selection and demodulation'20006,091,075'Automatic focus detection method, automatic focus detection apparatus, and inspection apparatus'20006,087,673'Method of inspecting pattern and apparatus thereof'20005,774,222'Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected'19985,649,022'Pattern checking method and checking apparatus'19975,430,548'Method and apparatus for pattern detection'1995D0351469'Portable automatic blood glucose analyzer'19945,309,108'Method of inspecting thin film transistor liquid crystal substrate and apparatus therefor'19945,229,607'Combination apparatus having a scanning electron microscope therein'19935,157,735'Chipping detection system and method'19925,153,444'Method and apparatus for detecting patterns'19925,038,048'Defect detection system and method for pattern to be inspected utilizing multiple-focus image signals'19914,791,586'Method of and apparatus for checking geometry of multi-layer patterns for IC structures'19884,725,722'Automatic focusing method and apparatus utilizing contrasts of projected pattern'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2017Patents assigned to HITACHI LTD (85)· patent assignee history
1988–2016Based in Yokohama, JP· patent location history
1991–2011Based in Kanagawa, JP· patent location history
1994Based in Hashimoto, JP· patent location history
2000–2020Based in Tokyo, JP· patent location history
2005–2017Patents assigned to HITACHI HIGH TECH CORP (71)· patent assignee history
2012–2017Patents assigned to MAEDA SHUNJI (36)· patent assignee history
2012–2017Patents assigned to SHIBUYA HISAE (15)· patent assignee history
2012–2014Patents assigned to HAMAMATSU AKIRA (12)· patent assignee history
2018Based in Hiroshima, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 85 | 1988–2017 |
| HITACHI HIGH TECH CORP | 71 | 2005–2017 |
| MAEDA SHUNJIself | 36 | 2012–2017 |
| SHIBUYA HISAE | 15 | 2012–2017 |
| HAMAMATSU AKIRA | 12 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 150 | 1988–2016 |
| Tokyo, JP | 8 | 2000–2020 |
| Kanagawa, JP | 7 | 1991–2011 |
| Hiroshima, JP | 1 | 2018 |
| Hashimoto, JP | 1 | 1994 |