Inventor
Shunichiro Uchimura
Inventor
Hitachi, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds36%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H01BCables14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C08LCompositions of macromolecular compounds7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y10TTechnical subjects covered by former us classification7%
PatentTitleYear
6,319,656'Photosensitive polyimide precursor and its use for pattern formation'20016,025,113'Photosensitve polymide precursor and its use for pattern formation'20005,905,117'Low dielectric resin composition'19995,132,386'Insulating resin composition and semiconductor device using the same'19924,497,922'Compositions of materials for forming protective film in semiconductor device'19854,338,426'Intermediate, copolymer resin and production thereof'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982–2001Patents assigned to HITACHI CHEMICAL CO LTD (6)· patent assignee history
1982–2001Based in Hitachi, JP· patent location history
1999Patents assigned to ASAHI GLASS CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 6 | 1982–2001 |
| ASAHI GLASS CO LTD | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachi, JP | 6 | 1982–2001 |