Inventor
Katsuyuki Oikawa
Inventor
Nishikamo-gun, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
C07CAcyclic or carbocyclic compounds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
G02BOptical elements, systems or apparatus8%
PatentTitleYear
5,772,925'Anti-reflective coating composition'19985,679,496'Chemically amplified positive resist composition'19975,629,134'Chemically amplified positive resist composition'19975,624,787'Chemically amplified positive resist composition'19975,529,888'Water-soluble film forming composition'19965,017,715'Iodotrimethylsilane compositions'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–1998Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
1991Based in Kawasaki, JP· patent location history
1996–1998Based in Nishikamo-gun, JP· patent location history
1997Patents assigned to NIPPON TELEGRAPH & TELEPHONE (3)· patent assignee history
1997Based in Niigata, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 6 | 1991–1998 |
| NIPPON TELEGRAPH & TELEPHONE | 3 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nishikamo-gun, JP | 4 | 1996–1998 |
| Niigata, JP | 1 | 1997 |
| Kawasaki, JP | 1 | 1991 |