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Inventor

Larry Clevenger

Inventor
Lagrangeville, NY, US

Overview

14→
Patents
2000–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1054%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H01JElectric discharge tubes or discharge lamps4%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
8,232,211'Methods for self-aligned self-assembled patterning enhancement'20127,906,426'Method of controlled low-k via etch for Cu interconnections'20117,365,001'Interconnect structures and methods of making thereof'20087,241,696'Method for depositing a metal layer on a semiconductor interconnect structure having a capping layer'20077,125,792'Dual damascene structure and method'20067,091,612'Dual damascene structure and method'20066,890,815'Reduced cap layer erosion for borderless contacts'20056,784,105'Simultaneous native oxide removal and metal neutral deposition method'20046,661,097'Ti liner for copper interconnect with low-k dielectric'20036,420,216'Fuse processing using dielectric planarization pillars'20026,361,880'CVD/PVD/CVD/PVD fill process'20026,281,114'Planarization after metal chemical mechanical polishing in semiconductor wafer fabrication'20016,136,709'Metal line deposition process'20006,057,236'CVD/PVD method of filling structures using discontinuous CVD AL liner'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2012Patents assigned to IBM (13)· patent assignee history
2000–2004Patents assigned to INFINEON TECHNOLOGIES CORP (4)· patent assignee history
2000–2012Based in Lagrangeville, NY, US· patent location history
2001–2011Patents assigned to INFINEON TECHNOLOGIES AG (3)· patent assignee history
2004Based in Hopewell Junction, NY, US· patent location history
2012Patents assigned to CLEVENGER LARRY (1)· patent assignee history
2012Patents assigned to DALTON TIMOTHY J (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM132000–2012
INFINEON TECHNOLOGIES CORP42000–2004
INFINEON TECHNOLOGIES AG32001–2011
CLEVENGER LARRYself12012
DALTON TIMOTHY J12012
Locations
LocationPatentsSpan
Lagrangeville, New York, US132000–2012
Hopewell Junction, New York, US12004