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Inventor

Shlomit KATZ

Inventor
IL

Overview

2→
Patents
2022
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G01BMeasuring length, thickness or similar linear dimensions10%
G01RMeasuring electric variables10%
G05BControl or regulating systems in general10%
H01LSemiconductor devices10%
PatentTitleYear
11,353,799System and method for error reduction for metrology measurements202211,353,493Data-driven misregistration parameter configuration and measurement system and method2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to KLA CORP (1)· patent assignee history
2022Patents assigned to KLA TENCOR CORP (1)· patent assignee history
2022Based in IL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KLA CORP12022
KLA TENCOR CORP12022
Locations
LocationPatentsSpan
IL22022