Inventor
Noriyoshi Mashimo
Inventor
Tokyo, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B08BCleaning in general17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
C02FTreatment of water, waste water, sewage, or sludge8%
C23CCoating metallic material8%
C30BSingle-crystal growth8%
F27BFurnaces, kilns, ovens or retorts in general8%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace8%
PatentTitleYear
5,415,191'Arrangement for cleaning semiconductor wafers using mixer'19955,352,359'Ultraviolet reactor with mixing baffle plates'19945,318,633'Heat treating apparatus'19945,261,966'Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1995Patents assigned to TOSHIBA KK (4)· patent assignee history
1993–1995Based in Tokyo, JP· patent location history
1994Patents assigned to EBARA CORP (1)· patent assignee history
1994Patents assigned to TEL SAGAMI LTD (1)· patent assignee history
1994Based in Iwate, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 4 | 1993–1995 |
| EBARA CORP | 1 | 1994 |
| TEL SAGAMI LTD | 1 | 1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 1993–1995 |
| Iwate, JP | 1 | 1994 |